Bath monitoring is considered to be labour intensive and it can be challenging to ensure that the etching rate is maintained at the right level with the right chemical dozing. For example, for texturing and etching bath, alkaline or acidic etching agents remove the surface damage induced by the sawing process and texture the surface of the wafer. Acidic etching agents, like HF and HNO3, are used for isotropic etching. Typical alkaline etching agents are caustic soda (NaOH), caustic potash (KOH), and tetramethylammonium hydroxide (TMAH) solutions. Because of the consumption and discharge of etching chemicals during the texturing process, it is necessary to measure the concentration and temperature continuously. This ensures consistent product quality and, if needed, more etching agents can be added. LiquiSonic® inline analysers monitor the current texturing and etching bath concentration. This enables an automatic additional dosing through the incorporation of existing process control systems.

At the end of the webinar, participants will be able to understand:

  1. Process Optimisation
  2. Cost Saving – Reducing OpEx
  3. Process Safety

Target Audience:

Process Engineer, Maintenance Engineer, QAQC Lab

Speakers’ Profile

Ko Weishen
Team Leader/Production & Application, Centrionics Systems & Services Sdn Bhd

Ko Weishen is from the Proposal & Project division at Centrionics, specialising in providing solutions to the evolving needs of the Industry. He has experience in multiple process improvement projects involving Gas and Liquid Analyzer of various technology including chromatography, non-dispersive infrared absorption, and sonic velocity, which also involves a Fire & Gas Detection System.